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Seminário New Frontiers in Thin Film Characterization with Spectroscopic Ellipsometry |
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Na próxima sexta-feira, 27 de março, às 10 horas será realizado no CTI o seminário New Frontiers In Thin Film Characterization With Spectroscopic Ellipsometry instrutor Rodolfo Carrera, PhD, na sala de aula do prédio II.
Estão todos convidados.
New Frontiers in Thin Film Characterization with Spectroscopic Ellipsometry
James N. Hilfiker
Spectroscopic Ellipsometry (SE) is a powerful optical measurement used to study thin film properties. It can provide accurate and precise characterization of thin film thickness and optical constants (n and k).
Additional material properties, such as optical anisotropy, surface roughness, optical gradients, doping concentration, and material composition can also be studied. The flexibility of SE has opened up applications in very diverse areas; including semiconductor, photolithography, photovoltaic, optical coating, biochemistry, displays, and more.
The seminar will be divided into three parts:
1. Description of fundamental theory of spectroscopic ellipsometry.
We will describe how thin film properties are determined from the optical measurement of polarization change. Modern software automates this process, but we will describe the steps that take place from placing your sample on an ellipsometer to reporting thickness and optical constants.
2. Overview of Spectroscopic Ellipsometer Solutions. The Woollam Company is the world leader in research SE products with over six families of instruments available. With nearly 2,000 SE systems installed around the world, top researchers are continually developing new applications with their Woollam instruments. The variety of instruments will be compared and the target applications will be discussed.
3. Applications of Spectroscopic Ellipsometry. Woollam ellipsometers are used for a huge variety of applications. We will quickly review recent SE applications ranging from thin film photovoltaics to anisotropic nanostructured materials.
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